Web17 nov. 2016 · At 90% uptimes, the utilization for EUV is only 70%, analysts said. EUV resists have other issues. “In EUV, you suffer from yield because of a stochastic phenomenon, line-edge roughness and contact-hole roughness caused by photon shot noise and other sources,” according to lithography expert Mack. WebJ. Bokor Dec. 9, 1997 IEDM Lithography Panel 7 70 nm lines/spaces (2:1 pitch) Coded for 70nm 15.6 mJ/cm2 dose 10x microstepper 70 nm lines TSI process No crosslinker Etch selectivity 45:1 1997 Resist / EUVL Imaging Status. J. Bokor UC Berkeley EUVL Trend 0.01 0.1 1 100 10 CD (nm) NA 0.1 1 10 DOF (m m) NA (k1=0.3)
ASML unveils EUV Technology Training Center in Taiwan
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Semiconductor Lithography (Photolithography) - The Basic Process
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